CUI Weizhe,HAN Yurui,GU Guangrui*.Preparation and properties of SnO2- CdO composite films[J].Journal of Yanbian University,2021,47(03):228-232.
SnO2 - CdO复合薄膜的制备及其光电性能研究
- Title:
- Preparation and properties of SnO2- CdO composite films
- 文章编号:
- 1004-4353(2021)03-0228-05
- 关键词:
- 磁控溅射; SnO2- CdO薄膜; 晶相结构; 透过率; 电阻率
- Keywords:
- magnetron sputtering; SnO2- CdO films; structure; transmittance; resistivity
- 分类号:
- O484.4
- 文献标志码:
- A
- 摘要:
- 使用射频磁控溅射技术,以原子百分比为4:1和1:4的SnO2和CdO制备了SnO2- CdO复合薄膜.XRD分析表明, SnO2- CdO(4:1)复合薄膜为SnO2(310)和Cd2SnO4(011)的混合相多晶结构,且结晶性能良好.随着氧流量的增加,薄膜的择优生长方向由SnO2(310)转变为Cd2SnO4(011).薄膜在可见光和近红外光范围内的最高透过率达到95%和91%, 最高平均透过率达到87%和85%, 光学带隙在3.80~3.90 eV范围内变化.电阻率随着薄氧流量的增加而下降,最低为0.133 Ω·cm.薄膜的厚度约为330 nm, 其表面由大量分布均匀的球形颗粒组成.原子百分比为4:1的SnO2- CdO复合薄膜的光电性能优于原子百分比为1:4的SnO2- CdO复合薄膜.
- Abstract:
- Using radio frequency magnetron sputtering technology, SnO2- CdO composite films were prepared with SnO2 and CdO with atomic percentages of 4:1 and 1:4. XRD analysis shows that the SnO2- CdO(4:1)composite film has a mixed - phase polycrystalline structure of SnO2(310)and Cd2SnO4(011), and has good crystalline properties. As the oxygen content increases, the preferred growth direction of the film changes from SnO2(310)to Cd2SnO4(011). The maximum transmittance of the film in the visible and near - infrared range can reach 95% and 91%, the average transmittance can reach 87% and 85%, and the optical band gap varies within the range of 3.80 - 3.90 eV. The resistivity decreases with the increase of the thin oxygen content, and the lowest resistivity is 0.133 Ω·cm. The thickness of the film is about 330 nm, and its surface is composed of a large number of uniformly distributed spherical particles. The photoelectric performance of the SnO2- CdO composite film with an atomic percentage of 4:1 is better than that of the SnO2- CdO composite film with an atomic percentage of 1:4.
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备注/Memo
收稿日期: 2021-04-20
基金项目: 吉林省自然科学基金(210101163)
*通信作者: 顾广瑞(1970—),男,博士,教授,研究方向为功能材料物理.