[1]栾书多,张佳鑫,顾广瑞*.金属Y掺杂Mo -N薄膜的机械性能和摩擦学性质研究[J].延边大学学报(自然科学版),2020,46(02):122-128.
　LUAN Shuduo,ZHANG Jiaxin,GU Guangrui*.Mechanical and tribological properties of Y- doped Mo -N films[J].Journal of Yanbian University,2020,46(02):122-128.
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金属Y掺杂Mo -N薄膜的机械性能和摩擦学性质研究

《延边大学学报(自然科学版)》[ISSN:1004-4353/CN:22-1191/N] 卷: 第46卷 期数: 2020年02期 页码: 122-128 栏目: 基础科学研究 出版日期: 2020-08-18
Title:
Mechanical and tribological properties of Y- doped Mo -N films
文章编号:
1004-4353(2020)02-0122-07
作者:
栾书多;  张佳鑫;  顾广瑞*
( 延边大学 理学院, 吉林 延吉 133002 )
Author(s):
LUAN Shuduo;  ZHANG Jiaxin;  GU Guangrui*
( College of Science, Yanbian University, Yanji 133002, China )
关键词:
磁控共溅射;  Mo -N 薄膜;  摩擦学性能
Keywords:
magnetron co -sputtering;  Mo -N thin films;  tribological properties
分类号:
O484.4
文献标志码:
A
摘要:
利用射频磁控和直流磁控共溅射的方法制备了金属Y掺杂的 Mo -N 薄膜.对制备的薄膜样品进行元素组成、微观结构、表面形貌、摩擦学性质分析显示:薄膜的择优取向由未掺杂时的γ -Mo2N(111)改变为Y掺杂后的γ -Mo2N(200).与未掺杂的 Mo -N 薄膜相比较,所制备的MoYN薄膜的硬度明显降低,但耐磨性和平均摩擦系数均有所改善.其中Y掺杂含量为9.44at%时,薄膜的耐磨性为最佳,平均摩擦系数为最小(0.283),硬度为(24.13±3.15)GPa.
Abstract:
A series of Y -doped Mo -N films were prepared by RF magnetron and D C magnetron co -sputtering. The element composition, microstructure, surface morphology, tribological properties of the film samples show that the preferred orientation of Mo -N film without doping is γ -Mo2N(111)and the preferred orientation of MoYN film after doping is changed to γ -Mo2N(200). Compared with the undoped Mo -N films, the hardness of the prepared MoYN films is decreased, while the wear resistance and average friction coefficient are increased. When the Y doping content is 9.44at%, the wear resistance is the best, the average friction coefficient is 0.283, and the hardness is(24.13±3.15)GPa.

参考文献/References:

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备注/Memo

收稿日期: 2019-12-16 基金项目: 国家自然科学基金资助项目(51272224)
*通信作者: 顾广瑞(1970—),男,博士,教授,研究方向为功能材料物理.

更新日期/Last Update: 2020-08-18