[1]杨功胜,郭智文,顾广瑞*,等.反应磁控共溅射制备Ti掺杂的Cu3N薄膜的特性研究[J].延边大学学报(自然科学版),2018,44(01):22-26,94.
 YANG Gongsheng,GUO Zhiwen,GU Guangrui*,et al.Investigation on properties of Ti-doped Cu3N films fabricatedby reaction magnetron co-sputtering[J].Journal of Yanbian University,2018,44(01):22-26,94.
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反应磁控共溅射制备Ti掺杂的Cu3N薄膜的特性研究

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相似文献/References:

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备注/Memo

收稿日期: 2017-11-13
基金项目: 国家自然科学基金资助项目(51272224,11164031)
*通信作者: 顾广瑞(1970—),男,博士,教授,研究方向为薄膜材料.

更新日期/Last Update: 2018-03-20